Overview of Lithographic processes
BALTFAB is orientated to alternative patterning methods using laser ablation and surface functionalization.
| Technique | Minimum feature size | Working area | Process speed | Applications |
|---|---|---|---|---|
| Dip Pen Nanolithography (DPN) | <50 nm | ~50×50 mm2 | Single tip 0,2-5 µm/s, highly scalable. | Most of the standard lithographic applications. Direct deposition of conducting and bifunctional compounds, nanoparticles, DNA, proteins, etc. In situ chemical reactions. Multilayer assembly. |
| Microcontact Printing (μCP) | ~100 nm | <100×100 mm2 | Centimeters-sized layouts can be replicated in ~ tens of seconds | Most of the standard lithographic applications. Direct deposition of conducting and bifunctional compounds, nanoparticles, proteins, etc. In situ chemical reactions. Microfluidics. |
| Piezoelectric InkJet Printing | ~30 µm; (~250 nm if combined with self-assembly) | 200×200 mm2 | Single nozzle <3 mm/s, ~100nL/s, scalable. | Most of the standard lithographic applications. Direct deposition of conducting and bifunctional compounds, polymers, nanoparticles, DNA, proteins, etc. In situ chemical reactions. Microfluidics. |
| Laser Direct Writing (LDW) | 3-5 µm | 200×200 mm2 | Up to 2 m/s with XYZ stages; 20 m/s with galvoscanners | Thin-film structuring. Selective and localized modifications of surface. |
| Ultrashort Pulse Laser Ablation (ULA) | 15 µm | 100x200x200 mm2 | Material dependent 1000-100000 µm3/s | 3D microfabrication; micromoulds. Microfluidics. |
| Laser Beam Interference Ablation (LBIA) | Period ~ wavelength; 100-200 nm | 0.5×0.5 mm2 | 1000 µm2/shot | 2D patterning of thin films and surfaces; surface modification. |
| Colloidal Nanolithography | <10 nm | <100×100 mm2 | N/A | Nanoparticle arrays, biomaterials, nanoplasmonics, etc. |
| Laser-Assisted Multicomponent Patterning | See LDW and LBIA, respectively | See LDW and LBIA, respectively | See ULA and LBIA, respectively | Arraying of different chemical functionalities on solid substrates. Design of bio-arrays. |
| Optical Microscopy- Based Photolithography | ~200 nm | <100×100 mm2 | Slower than in µCP. | Standard lithographic applications. For rapid prototyping, reference structures, etc. |
Pricing
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