This type of lithography uses colloidal particles with precise diameters and/or shapes as a sacrificial mask. The particles are transferred onto a substrate, i.e. gold coated Si, and self orders themselves into a precise mesh. The liquid is then dried out and standard processing, i.e. Au etching, is performed to remove exposed areas. As colloidal nano-particles have low etch selectivity, the etchant removes them as well, although at a slower rate then the Au.
Absorbing surface required: Au on Si